Title:
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, RADIATION-SENSITIVE ACID GENERATOR, AND COMPOUND
Document Type and Number:
WIPO Patent Application WO/2015/141504
Kind Code:
A1
Abstract:
The present invention is a radiation-sensitive resin composition containing a radiation-sensitive acid generator and a polymer having a structural unit containing an acid-dissociable group, the radiation-sensitive acid generator containing a compound represented by formula (A). In formula (A), Rx is an alicyclic hydrocarbon group, an aliphatic heterocyclic group containing -O-, -COO-, -OCOO-, -S-, -SO2O-, -NHCOO-, or -SiR3
2 at a carbon-carbon bond of the alicyclic hydrocarbon group, or a group resulting from substituting a hydrogen atom of the alicyclic hydrocarbon group or aliphatic heterocyclic group with -OH, -CN, a hydrocarbon group, an oxyhydrocarbon group, or a halogen atom. Rt and Ry are each bonded to the same carbon atom or two adjacent carbon atoms in the ring structure of Rx. M+ is a radiation-sensitive onium cation.
More Like This:
Inventors:
SAITO RYUICHI (JP)
NAMAI HAYATO (JP)
NAMAI HAYATO (JP)
Application Number:
PCT/JP2015/056753
Publication Date:
September 24, 2015
Filing Date:
March 06, 2015
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
G03F7/004; C07C309/19; C07C309/23; C07D307/00; C07D333/50; C09K3/00; G03F7/038; G03F7/039
Domestic Patent References:
| WO2012070548A1 | 2012-05-31 | |||
| WO2012090959A1 | 2012-07-05 |
Foreign References:
| JP2010250063A | 2010-11-04 | |||
| JP2014224984A | 2014-12-04 |
Attorney, Agent or Firm:
AMANO KAZUNORI (JP)
Kazuki Amano (JP)
Kazuki Amano (JP)
Download PDF:
Previous Patent: PRESS MACHINE
Next Patent: POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SUBSTRATE
Next Patent: POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SUBSTRATE