Title:
RADIATION-SENSITIVE RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2010/007971
Kind Code:
A1
Abstract:
Disclosed is a radiation-sensitive resin composition which enables the production of a chemically amplified resist having excellent resolution performance and small nano edge roughness. The radiation-sensitive resin composition comprises (A) a radiation-sensitive acid generator having a partial structure represented by general formula (1) and (B) a resin. [In general formula (1), R1 represents a univalent hydrocarbon group, or the like.]
Inventors:
SHIMOKAWA TSUTOMU (JP)
EBATA TAKUMA (JP)
SAKAI KAORI (JP)
OIZUMI YOSHIFUMI (JP)
SOYANO AKIMASA (JP)
OTSUKA NOBORU (JP)
EBATA TAKUMA (JP)
SAKAI KAORI (JP)
OIZUMI YOSHIFUMI (JP)
SOYANO AKIMASA (JP)
OTSUKA NOBORU (JP)
Application Number:
PCT/JP2009/062697
Publication Date:
January 21, 2010
Filing Date:
July 13, 2009
Export Citation:
Assignee:
JSR CORP (JP)
SHIMOKAWA TSUTOMU (JP)
EBATA TAKUMA (JP)
SAKAI KAORI (JP)
OIZUMI YOSHIFUMI (JP)
SOYANO AKIMASA (JP)
OTSUKA NOBORU (JP)
SHIMOKAWA TSUTOMU (JP)
EBATA TAKUMA (JP)
SAKAI KAORI (JP)
OIZUMI YOSHIFUMI (JP)
SOYANO AKIMASA (JP)
OTSUKA NOBORU (JP)
International Classes:
G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| WO2006121096A1 | 2006-11-16 | |||
| WO2008056796A1 | 2008-05-15 | |||
| WO2008029673A1 | 2008-03-13 | |||
| WO2007069640A1 | 2007-06-21 |
Foreign References:
| JP2005112724A | 2005-04-28 |
Attorney, Agent or Firm:
WATANABE, Kazuhira (JP)
Ippei Watanabe (JP)
Ippei Watanabe (JP)
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