RADICAL SOURCE AND MOLECULAR BEAM EPITAXY APPARATUS

Title:

RADICAL SOURCE AND MOLECULAR BEAM EPITAXY APPARATUS

Document Type and Number:

WIPO Patent Application WO/2012/026113

Kind Code:

A1

Abstract:

[Objective] To attain a radical source whereby high-density radicals can be generated. [Solution] A radical source has: a supplying tube (10) comprising SUS; and a cylindrical plasma generating tube (11) comprising pyrolytic boron nitride (PBN), and which is connected to the supplying tube (10). The radical source has a cylindrical CCP electrode (13) arranged at the outer side of the plasma generating tube (11), and comprises a coil (12) wound along the outer circumference of the plasma generating tube (11), at the down stream side of the CCP electrode (13). A parasitic-plasma prevention tube (15) comprising ceramics is inserted into an opening of the supplying tube (10) that is located at the connection point of the supplying tube (10) and the plasma generating tube (11).

Inventors:

HORI MASARU (JP)
AMANO HIROSHI (JP)
KANO HIROYUKI (JP)
DEN SHOJI (JP)
YAMAKAWA KOJI (JP)

Application Number:

PCT/JP2011/004684

Publication Date:

March 01, 2012

Filing Date:

August 24, 2011

Export Citation:

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Assignee:

UNIV NAGOYA NAT UNIV CORP (JP)
NU ECO ENGINEERING CO LTD (JP)
KATAGIRI ENGINEERING CO LTD (JP)
HORI MASARU (JP)
AMANO HIROSHI (JP)
KANO HIROYUKI (JP)
DEN SHOJI (JP)
YAMAKAWA KOJI (JP)

International Classes:

H01L21/203; C23C14/24; C30B23/08; H05H1/24

Foreign References:

JPH02218433A	1990-08-31
JP2005307332A	2005-11-04
JP2009004157A	2009-01-08
JP2008078200A	2008-04-03

Other References: