Title:
RADIOACTIVE-RAY-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2024/057751
Kind Code:
A1
Abstract:
Provided are: a radioactive-ray-sensitive resin composition that can exhibit sufficient levels of sensitivity and CDU performance when a next-generation technology is applied to the composition; and a pattern formation method. The radioactive-ray-sensitive resin composition comprises an onium salt compound containing a structure represented by formula (1), a resin containing a structure unit (I) having a phenolic hydroxyl group or a group capable of providing a phenolic hydroxyl group by the action of an acid, and a solvent. (In formula (1), Rf1 and Rf2 each independently represent a hydrogen atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms, a fluorine atom, or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms; R1, R2 and R3 each independently represent a hydrogen atom, or a monovalent organic group having 1 to 20 carbon atoms; n1 and n2 each independently represent an integer of 0 to 4; X1 and X2 each independently represent an oxygen atom or a sulfur atom: L represents a substituted or unsubstituted bivalent hydrocarbon group having 1 to 10 carbon atoms; R4 and R5 each independently represent a hydrogen atom or a monovalent organic group having 1 to 40 carbon atoms; at least one of R4 and R5 represents a monovalent aromatic-ring-containing organic group containing a 5- to 40-membered aromatic ring; and Z+ represents a monovalent radioactive-ray-sensitive onium cation.)
Inventors:
NISHIKORI KATSUAKI (JP)
KIRIYAMA KAZUYA (JP)
TANIGUCHI TAKUHIRO (JP)
KINOSHITA NATSUKO (JP)
KIRIYAMA KAZUYA (JP)
TANIGUCHI TAKUHIRO (JP)
KINOSHITA NATSUKO (JP)
Application Number:
PCT/JP2023/028119
Publication Date:
March 21, 2024
Filing Date:
August 01, 2023
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
G03F7/004; C07D317/24; C08F8/12; C08F212/14; C08F220/12; G03F7/039; G03F7/20
Domestic Patent References:
| WO2021241246A1 | 2021-12-02 | |||
| WO2020129683A1 | 2020-06-25 |
Attorney, Agent or Firm:
UNIUS PATENT ATTORNEYS OFFICE (JP)
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