Title:
RAPID THERMAL PROCESSING CHAMBER WITH MICRO-POSITIONING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2010/054076
Kind Code:
A3
Abstract:
Methods and apparatus for rapid thermal processing of a planar substrate including axially aligning the substrate with a substrate support or with an empirically determined position are described. The methods and apparatus include a sensor system that determines the relative orientations of the substrate and the substrate support.
Inventors:
SORABJI KHURSHED (US)
RANISH JOSEPH M (US)
ADERHOLD WOLFGANG (US)
HUNTER AARON M (US)
KOELMEL BLAKE R (US)
LERNER ALEXANDER N (US)
MERRY NIR (US)
RANISH JOSEPH M (US)
ADERHOLD WOLFGANG (US)
HUNTER AARON M (US)
KOELMEL BLAKE R (US)
LERNER ALEXANDER N (US)
MERRY NIR (US)
Application Number:
PCT/US2009/063394
Publication Date:
July 29, 2010
Filing Date:
November 05, 2009
Export Citation:
Assignee:
APPLIED MATERIALS INC (US)
SORABJI KHURSHED (US)
RANISH JOSEPH M (US)
ADERHOLD WOLFGANG (US)
HUNTER AARON M (US)
KOELMEL BLAKE R (US)
LERNER ALEXANDER N (US)
MERRY NIR (US)
SORABJI KHURSHED (US)
RANISH JOSEPH M (US)
ADERHOLD WOLFGANG (US)
HUNTER AARON M (US)
KOELMEL BLAKE R (US)
LERNER ALEXANDER N (US)
MERRY NIR (US)
International Classes:
H01L21/324; H01L21/68; H01L21/683; H01L21/687
Foreign References:
| KR20030044302A | 2003-06-09 | |||
| US5740062A | 1998-04-14 | |||
| US5982986A | 1999-11-09 |
Attorney, Agent or Firm:
SERVILLA, Scott S. (77 Brant Avenue Suite 21, Clark New Jersey, US)
Download PDF: