RAPID THERMAL PROCESSING LAMP AND METHOD FOR MANUFACTURING THE SAME

Title:

RAPID THERMAL PROCESSING LAMP AND METHOD FOR MANUFACTURING THE SAME

Document Type and Number:

WIPO Patent Application WO2002049395

Kind Code:

A3

Abstract:

A method and system for inductively coupling energy to a heating filament (7A', 7B', 7C', 7A, 7B, 7C) in a thermal processing environment. By applying AC power to a coil antenna (11) and inductive coupling to a filament (e.g., a halogen lamp filament), a number of connections that are subject to fatigue is reduced, thereby increasing the reliability of the heater (2A, 2B). Such an environment can be used to process semiconductor wafers (3) and liquid crystal displays.

Inventors:

JOHNSON WAYNE L (US)

Application Number:

PCT/US2001/044708

Publication Date:

January 23, 2003

Filing Date:

December 12, 2001

Export Citation:

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Assignee:

TOKYO ELECTRON LTD (JP)
JOHNSON WAYNE L (US)

International Classes:

F27B5/14; F27B17/00; H01L21/00; H05B3/00; H05B6/02; H05B6/10; (IPC1-7): F27B5/14

Foreign References:

US5800621A	1998-09-01
US5294778A	1994-03-15
US5905343A	1999-05-18

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