Title:
RAW MATERIAL FOR FORMING THIN FILM AND METHOD FOR PRODUCING THIN FILM
Document Type and Number:
WIPO Patent Application WO/2017/203775
Kind Code:
A1
Abstract:
Provided is a raw material which is for forming a thin film and contains a compound represented by general formula (1) below, where R1 represents a linear or branched alkyl group having 2-4 carbon atoms, R2-R5 each independently represent a linear or branched alkyl group having 1-4 carbon atoms, A represents an alkanediyl group having 1-4 carbon atoms, and M represents titanium, zirconium, or hafnium. When M is zirconium, A is an alkanediyl group having 3 or 4 carbon atoms. When M is titanium and hafnium, A is preferably an alkanediyl group having 2 or 3 carbon atoms. When M is zirconium, A is preferably an alkanediyl group having 3 carbon atoms.
Inventors:
SATO HIROKI (JP)
YAMADA NAOKI (JP)
SHIRATORI TSUBASA (JP)
SATO HARUYOSHI (JP)
YAMADA NAOKI (JP)
SHIRATORI TSUBASA (JP)
SATO HARUYOSHI (JP)
Application Number:
PCT/JP2017/007483
Publication Date:
November 30, 2017
Filing Date:
February 27, 2017
Export Citation:
Assignee:
ADEKA CORP (JP)
International Classes:
C23C16/40; H01L21/316
Foreign References:
| JP2014510733A | 2014-05-01 | |||
| KR20140078534A | 2014-06-25 |
Other References:
CHIRINOS,J. ET AL.: "Ethene homo- and ethene/propene copolymerization using a MAO activated cyclopentadienyl-amido half-sandwich complex", MACROMOLECULAR CHEMISTRY AND PHYSICS, vol. 201, no. 7, November 2000 (2000-11-01), pages 2581 - 2585, XP055509605
Attorney, Agent or Firm:
SOGA, Michiharu et al. (JP)
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