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Title:
RAW MATERIAL GAS SUPPLY SYSTEM AND RAW MATERIAL GAS SUPPLY METHOD
Document Type and Number:
WIPO Patent Application WO/2021/039493
Kind Code:
A1
Abstract:
A raw material gas supply system that supplies a raw material gas generated by vaporizing a solid raw material to a processing device comprises: a vaporizing device that vaporizes the solid raw material to generate the raw material gas; a delivery mechanism that delivers a solution in which the solid raw material is dissolved in a solvent from a solution source that stores the solution to the vaporizing device; and an evaporation mechanism that evaporates the solvent of the solution delivered from the delivery mechanism and accommodated in the vaporizing device to separate the solid raw material.

Inventors:
OKABE TSUNEYUKI (JP)
OKURA SHIGEYUKI (JP)
KOMORI EIICHI (JP)
Application Number:
PCT/JP2020/031087
Publication Date:
March 04, 2021
Filing Date:
August 18, 2020
Export Citation:
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Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
C23C16/448; H01L21/285
Foreign References:
JP2008038211A2008-02-21
JP2008538158A2008-10-09
JP2004115831A2004-04-15
JP2008522029A2008-06-26
JP2015110837A2015-06-18
JP2016191140A2016-11-10
JP2005535112A2005-11-17
Attorney, Agent or Firm:
KANEMOTO, Tetsuo et al. (JP)
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