REACTION APPARATUS FOR PRODUCING TRICHLOROSILANE GAS

WIPO Patent Application WO/2010/123232

A2

The present invention relates to a reaction apparatus for producing trichlorosilane gas. The reaction apparatus comprises: a cylindrical casing which receives silicon tetrachloride gas and hydrogen gas through the lower portion thereof and guides the received gas to the upper portion thereof; a heater installed in the casing to supply heat into the casing; an induction heating unit for induction-heating the heater; a heating medium which is injected into the casing and which is constituted by inert inorganic particles; and a plurality of nozzles arranged in the lower portion of the casing to spray the silicon tetrachloride gas and the hydrogen gas into the casing. The thus-configured reaction apparatus for producing trichlorosilane gas according to the present invention enables the silicon tetrachloride gas and the hydrogen gas to be remarkably uniformly mixed, and in particular has superior heat transfer efficiency, improved overall operating efficiency, and low operating costs. The reaction apparatus of the present invention minimizes the temperature of the heater relative to the mixture gas of the silicon tetrachloride gas and the hydrogen gas to prevent a side reaction of the hydrogen gas with the heater, thereby producing high purity trichlorosilane gas.

KWON YOUNG JIN (KR)
KIM JEONG HEE (KR)

PCT/KR2010/002411

October 28, 2010

April 19, 2010

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ADRM TECHNOLOGIES CO LTD (KR)
KWON YOUNG JIN (KR)
KIM JEONG HEE (KR)

B01J12/00; B01J19/26; B01J19/32; C01B33/107

US20080112875A1	2008-05-15
EP1454670A1	2004-09-08
US20090060820A1	2009-03-05
US20090060817A1	2009-03-05

Y.P.LEE, MOCK & PARTNERS (KR)
리앤목특허법인 (KR)

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