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Patent Searching and Data


Title:
REACTION DEVICE AND REACTION METHOD
Document Type and Number:
WIPO Patent Application WO/2010/016424
Kind Code:
A1
Abstract:
Provided are a reaction device and a reaction method to efficiently oxidize or reduce a thin film at low temperature in a short time. The reaction device is provided with a chamber (3), a holding mechanism (2) disposed in the chamber and that holds a substrate (1) on which a thin film is formed, a pH adjusting mechanism that adjusts the pH of a polar solvent, a heating mechanism that heats the polar solvent, the pH of which has been adjusted by the pH adjusting mechanism, and a supply mechanism that supplies the polar solvent heated by the heating mechanism to the substrate held in the holding mechanism. The device is characterized in that an oxidation reaction or a reduction reaction for the thin film is induced by the polar solvent that has been heated and the pH of which has been adjusted.

Inventors:
HONDA YUUJI (JP)
SUZUKI MITSUHIRO (JP)
TANAKA MASAFUMI (JP)
Application Number:
PCT/JP2009/063576
Publication Date:
February 11, 2010
Filing Date:
July 30, 2009
Export Citation:
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Assignee:
YOUTEC CO LTD (JP)
HONDA YUUJI (JP)
SUZUKI MITSUHIRO (JP)
TANAKA MASAFUMI (JP)
International Classes:
B01J19/24; B01J3/00; B01J3/02; B01J19/00; B01J19/10; C01B13/14; H01L21/316
Foreign References:
JP2000357686A2000-12-26
JP2005519481A2005-06-30
JP2006282464A2006-10-19
JP2003213425A2003-07-30
Attorney, Agent or Firm:
YANASE, Mutsuyasu et al. (JP)
Mutsuyasu Yanase (JP)
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