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Title:
REACTIVE SPUTTERING METHOD AND DEVICE
Document Type and Number:
WIPO Patent Application WO/2003/100113
Kind Code:
A1
Abstract:
A method for forming a film on a substrate (3) placed in a vacuum chamber (1) by reactive sputtering by using a reactive sputtering device comprising a sputter evaporation source (2) provided in the vacuum chamber (1) and having a metal target, a sputter power supply (4) for driving the sputter evaporation source (2), and an introduction mechanism (5) for introducing an inert gas for sputtering and a reactive gas forming a compound with the sputtered metal into the vacuum chamber (1), wherein constant voltage control to keep the voltage of the sputter power supply (4) at a target voltage Vs is carried out, and the target voltage control to control the target voltage Vs is carried out at a control speed lower than that of the constant voltage control so that the spectrum of plasma emission produced in front of the sputter evaporation source (2) may be a target one.

Inventors:
Ikari, Yoshimitsu c/o Takasago Works in Kobe Steel Ltd. (3-1, Shinhama 2-chome, Arai-ch, Takasago-shi Hyogo, 676-8670, JP)
Tamagaki, Hiroshi c/o Takasago Works in Kobe Steel Ltd. (3-1, Shinhama 2-chome, Arai-ch, Takasago-shi Hyogo, 676-8670, JP)
Kohara, Toshimitsu c/o Takasago Works in Kobe Steel Ltd. (3-1, Shinhama 2-chome, Arai-ch, Takasago-shi Hyogo, 676-8670, JP)
Application Number:
PCT/JP2003/006583
Publication Date:
December 04, 2003
Filing Date:
May 26, 2003
Export Citation:
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Assignee:
KABUSHIKI KAISHA KOBE SEIKO SHO (10-26, Wakinohama-cho 2-chome Chuo-k, Kobe-shi Hyogo, 651-8585, JP)
Ikari, Yoshimitsu c/o Takasago Works in Kobe Steel Ltd. (3-1, Shinhama 2-chome, Arai-ch, Takasago-shi Hyogo, 676-8670, JP)
Tamagaki, Hiroshi c/o Takasago Works in Kobe Steel Ltd. (3-1, Shinhama 2-chome, Arai-ch, Takasago-shi Hyogo, 676-8670, JP)
Kohara, Toshimitsu c/o Takasago Works in Kobe Steel Ltd. (3-1, Shinhama 2-chome, Arai-ch, Takasago-shi Hyogo, 676-8670, JP)
International Classes:
C23C14/34; C23C14/00; C23C14/08; C23C14/32; C23C14/54; F02B67/06; F16H7/08; H01J37/32; H01J37/34; (IPC1-7): C23C14/34
Foreign References:
JP2002180247A
EP0508359A1
EP0416241A2
EP0430229A2
Other References:
SPROUL W.D. ET AL.: 'Multi-level control for reactive sputtering' SOCIETY OF VACUUM COATERS; 45TH ANNUAL TECHNICAL CONFERENCE PROCEEDINGS 13 April 2002 - 18 April 2002, pages 11 - 15, XP002972312
See also references of EP 1553206A1
Attorney, Agent or Firm:
Yasuda, Toshio (YASUDA & OKAMOTO, 7 & 6th Floor Shori Building, 7-19, Takaida-hondori 7-chom, Higashi-Osaka-shi Osaka, 577-0066, JP)
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