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Title:
Reagent for Enhancing Generation of Chemical Species
Document Type and Number:
WIPO Patent Application WO/2015/129284
Kind Code:
A1
Abstract:
A reagent that enhances acid generation of a photoacid generator and composition containing such reagent is disclosed.

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Inventors:
ENOMOTO SATOSHI (JP)
Application Number:
PCT/JP2015/001066
Publication Date:
September 03, 2015
Filing Date:
February 27, 2015
Export Citation:
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Assignee:
TOYO GOSEI CO LTD (JP)
International Classes:
G03F7/004
Domestic Patent References:
WO2004047166A22004-06-03
WO2014129556A12014-08-28
Foreign References:
US4251619A1981-02-17
JP2002311586A2002-10-23
JPH04165359A1992-06-11
US6171755B12001-01-09
Other References:
SEIICHI TAGAWA ET AL.: "Super High Sensitivity Enhancement by Photo-Sensitized Chemically Amplified Resist (PS-CAR) Process", JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, vol. 26, no. 6, 2013, Japan, pages 825 - 830, XP055221442
SEIICHI TAGAWA ET AL.: "Development of technology for increasing by 10 times the manufacturing speed of next-generation semiconductors", OSAKA UNIV., 24 June 2013 (2013-06-24), Retrieved from the Internet [retrieved on 20150508]
Attorney, Agent or Firm:
KURIHARA, Hiroyuki et al. (Iwasaki Bldg. 6F 3-15, Hiroo 1-chome, Shibuya-k, Tokyo 12, JP)
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