Title:
RECTANGULAR GATE VACUUM VALVE, OPERATION METHOD THEREFOR, AND SEMICONDUCTOR MANUFACTURING DEVICE COMPRISING SAME
Document Type and Number:
WIPO Patent Application WO/2016/163588
Kind Code:
A1
Abstract:
The present invention relates to a rectangular gate vacuum valve, an operation method therefor, and a semiconductor manufacturing device comprising the same. The rectangular gate vacuum valve of the present invention comprises: a gate frame having a first gate and a second gate formed on both side surfaces thereof facing each other; a first valve unit arranged so as to enable linear movement or rotation within the gate frame through a lower opening of the gate frame, and selectively opening and closing the first gate; and a second valve unit arranged so as to enable linear movement or rotation within the gate frame through an upper opening of the gate frame, and selectively opening and closing the second gate.
Inventors:
AHN HEE JUN (KR)
Application Number:
PCT/KR2015/005258
Publication Date:
October 13, 2016
Filing Date:
May 26, 2015
Export Citation:
Assignee:
FUGEN CO LTD (KR)
International Classes:
H01L21/02; F16K3/18
Foreign References:
| JP2004197769A | 2004-07-15 | |||
| JPH11248012A | 1999-09-14 | |||
| KR20090112134A | 2009-10-28 | |||
| KR101128877B1 | 2012-03-26 |
Attorney, Agent or Firm:
KIM, YOUNG KWAN (KR)
김영관 (KR)
김영관 (KR)
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