Title:
REFLECTION PREVENTING FILM AND METHOD FOR MANUFACTURING SAME, AND REFLECTION PREVENTING LAYER-ATTACHED POLARIZATION PLATE
Document Type and Number:
WIPO Patent Application WO/2017/217526
Kind Code:
A1
Abstract:
This reflection preventing film (100) is provided with a reflection preventing layer (5) which is disposed on one primary surface of a transparent film substrate (1) and comprises a plurality of thin films (51, 52, 53, 54) having different refractive indexes. The moisture permeability of the reflection preventing film is 15-1,000 g/m2·24h. The surface of the reflection preventing layer (5) has an indentation elastic modulus of 20-100 GPa, and an average arithmetic roughness Ra of 3 nm or less. The average arithmetic roughness Ra of the surface of the reflection preventing layer is preferably equal to or less than 1.5 nm. The thin films constituting the reflection preventing layer are formed by using, for example, a sputtering method.
Inventors:
MIYAMOTO KODAI (JP)
KANATANI MINORU (JP)
NASHIKI TOMOTAKE (JP)
KANATANI MINORU (JP)
NASHIKI TOMOTAKE (JP)
Application Number:
PCT/JP2017/022267
Publication Date:
December 21, 2017
Filing Date:
June 16, 2017
Export Citation:
Assignee:
NITTO DENKO CORP (JP)
International Classes:
G02B1/115; B32B7/02; C23C14/08; G02B1/14; G02B1/18; G02B5/30
Foreign References:
| JP2009047876A | 2009-03-05 | |||
| JP2009282219A | 2009-12-03 | |||
| JP2008268328A | 2008-11-06 | |||
| JP2009109850A | 2009-05-21 | |||
| JP2008233667A | 2008-10-02 | |||
| JP2013178534A | 2013-09-09 | |||
| JP2004053797A | 2004-02-19 | |||
| JP2016156995A | 2016-09-01 |
Attorney, Agent or Firm:
SHINTAKU, Masato et al. (JP)
Download PDF: