Title:
REFLECTION REDUCTION FILM, MANUFACTURING METHOD THEREOF, AND MANUFACTURING METHOD OF MOLD THEREOF
Document Type and Number:
WIPO Patent Application WO/2018/049898
Kind Code:
A1
Abstract:
A reflection reduction film, a manufacturing method thereof, and a manufacturing method of a mold thereof. The reflection reduction film comprises a subwavelength structure layer (1). The subwavelength structure layer (1) comprises a protruding structure (2) providing protection to the subwavelength structure layer (1). The protruding structure (2) prevents oil and fine dust particles from being attached to an uneven structure (2) of the subwavelength structure, and prevents the uneven structure of the subwavelength structure layer (1) from being damaged owing to contacting a hard object and abrasive wear, thereby prolonging the service life of the reflection reduction film.
Inventors:
XU LIANGHENG (CN)
ZHUANG XIAOLEI (CN)
ZHUANG XIAOLEI (CN)
Application Number:
PCT/CN2017/092750
Publication Date:
March 22, 2018
Filing Date:
July 13, 2017
Export Citation:
Assignee:
SHANGHAI TECHSUN ANTI COUNTERFEITING TECH HOLDING CO LTD (CN)
International Classes:
G02B1/118
Foreign References:
| JP2011150186A | 2011-08-04 | |||
| CN103668130A | 2014-03-26 | |||
| JP2003315526A | 2003-11-06 | |||
| JP2015079274A | 2015-04-23 | |||
| CN101398618A | 2009-04-01 | |||
| CN103364848A | 2013-10-23 |
Attorney, Agent or Firm:
SHANGHAI BESHINING LAW OFFICE (CN)
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