Title:
REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK BLANK MANUFACTURING METHOD, AND REFLECTIVE MASK MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2023/026868
Kind Code:
A1
Abstract:
This reflective mask blank has a substrate, a multilayer reflection film that reflects EUV light, and a phase shift film that shifts the phase of the EUV light in this order. The phase shift film contains a compound containing Ru and an element X2 different from Ru. A melting point MP1 of an oxide of the compound and a melting point MP2 of a fluoride or an acid fluoride of the compound satisfy expression (1) in the description.
Inventors:
TAKI SHUNYA (JP)
IWAOKA HIROAKI (JP)
AKAGI DAIJIRO (JP)
ISHIKAWA ICHIRO (JP)
IWAOKA HIROAKI (JP)
AKAGI DAIJIRO (JP)
ISHIKAWA ICHIRO (JP)
Application Number:
PCT/JP2022/030631
Publication Date:
March 02, 2023
Filing Date:
August 10, 2022
Export Citation:
Assignee:
AGC INC (JP)
International Classes:
G03F1/24; G03F1/32; G03F1/54
Domestic Patent References:
| WO2021100383A1 | 2021-05-27 | |||
| WO2020160851A1 | 2020-08-13 | |||
| WO2019225736A1 | 2019-11-28 |
Attorney, Agent or Firm:
ITOH, Tadashige et al. (JP)
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