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Title:
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
Document Type and Number:
WIPO Patent Application WO/2023/095769
Kind Code:
A1
Abstract:
The purpose of the present disclosure is to provide a reflective photomask blank and a reflective photomask that maximize the effectiveness of a phase shift effect and that possess high transferability (especially resolution). A reflective photomask blank (100) according to one embodiment of the present disclosure is characterized by: comprising a substrate (11), a reflective layer (12) for reflecting EUV light and having a multilayer film structure formed atop the substrate (11), a protective layer (13) that is formed atop the reflective layer (12) and that protects the reflective layer (12), and an absorption layer (14) for absorbing EUV light and formed atop the protective layer (13); and the absorption layer (14) having a phase difference within a range from 200 degrees to 280 degrees.

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Inventors:
MIYAWAKI DAISUKE (JP)
SEKI KAZUNORI (JP)
NAKANO HIDEAKI (JP)
Application Number:
PCT/JP2022/043116
Publication Date:
June 01, 2023
Filing Date:
November 22, 2022
Export Citation:
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Assignee:
TOPPAN PHOTOMASK CO LTD (JP)
International Classes:
G03F1/24; C23C14/06; G03F1/54
Domestic Patent References:
WO2021085382A12021-05-06
WO2021132111A12021-07-01
WO2019225737A12019-11-28
Foreign References:
JP2020106639A2020-07-09
Attorney, Agent or Firm:
HIROSE Hajime et al. (JP)
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