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Title:
RELEASE AGENT COMPOSITION FOR PHOTOIRRADIATION RELEASE, LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2024/048493
Kind Code:
A1
Abstract:
Provided is a release agent composition for photoirradiation release, the release agent composition containing a novolak resin, a (meth)acrylic ester polymer, and a solvent.

Inventors:
FUKUDA TAKUYA (JP)
SHINJO TETSUYA (JP)
Application Number:
PCT/JP2023/030881
Publication Date:
March 07, 2024
Filing Date:
August 28, 2023
Export Citation:
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Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
H01L21/02; C08K5/00; C08L33/06; C08L33/12; C08L61/10
Domestic Patent References:
WO2022019211A12022-01-27
WO2022114112A12022-06-02
Attorney, Agent or Firm:
TAKAOKA Ryoichi et al. (JP)
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