Title:
RELEASE FILM
Document Type and Number:
WIPO Patent Application WO/2000/021752
Kind Code:
A1
Abstract:
A release film comprising a polyethylene naphthalate film as a base film and a release layer formed on one or both sides of the film, characterized in that the polyethylene naphthalate is made from an acid ingredient consisting mainly of naphthalenedicarboxylic acid and a glycol ingredient consisting mainly of ethylene glycol and contains a manganese compound, a phosphorus compound, and an antimony compound in such amounts that the amounts of manganese (Mn), phosphorus (P), and antimony (Sb) satisfy all the relationships (1) to (3), and that the base film has a center-line average surface roughness (Ra) of 2 to 50 nm. 0.7=Mn=1.6 (1), 0.5=Mn/P=1.2 (2), 0.7=Sb=2.2 (3) (In the relationships, Mn, P, and Sb are the numbers of moles of the respective elements per 100 g of the acid ingredient).
Inventors:
SUMI HIROYUKI (JP)
Application Number:
PCT/JP1999/005675
Publication Date:
April 20, 2000
Filing Date:
October 14, 1999
Export Citation:
Assignee:
TEIJIN LTD (JP)
SUMI HIROYUKI (JP)
SUMI HIROYUKI (JP)
International Classes:
C08J5/14; C09J7/22; (IPC1-7): B32B27/36; B32B27/00
Domestic Patent References:
| WO1998014328A1 | 1998-04-09 |
Foreign References:
| JPH10138431A | 1998-05-26 |
Other References:
See also references of EP 1040915A4
Attorney, Agent or Firm:
Ohshima, Masataka (Yotsuya 4-chome Shinjuku-ku Tokyo, JP)
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