Title:
REPLICA MOLD FOR IMPRINTING AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2020/116397
Kind Code:
A1
Abstract:
[Problem] To provide a novel replica mold for imprinting.
[Solution] A replica mold for imprinting, which is provided with a layer A described below and a layer B described below, said layer B being bonded to the layer A.
Layer A: a structure which is formed of a cured product of a composition that contains the following component (a1) and component (a2)
Component (a1): a compound which has at least one radically polymerizable group in each molecule
Component (a2): a radical photopolymerization initiator in an amount of from 0.01% by mass to 0.3% by mass relative to 100% by mass of the component (a1)
Layer B: a film which is formed of a cured product of a composition that contains the following component (b1) and component (b2)
Component (b1): a compound which is composed of a linear or chain-like molecular chain containing a fluorine atom, and which has a radically polymerizable group at all terminals of the molecular chain
Component (b2): a radical photopolymerization initiator in an amount of from 0.05% by mass to 15% by mass relative to 100% by mass of the component (b1)
Inventors:
KOBAYASHI JUNPEI (JP)
KATO TAKU (JP)
NAGASAWA TAKEHIRO (JP)
KATO TAKU (JP)
NAGASAWA TAKEHIRO (JP)
Application Number:
PCT/JP2019/047048
Publication Date:
June 11, 2020
Filing Date:
December 02, 2019
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
B32B27/30; B29C33/38; B29C33/56; B29C59/02; C08F290/06; H01L21/027
Foreign References:
| JP2010105357A | 2010-05-13 | |||
| JP2010080670A | 2010-04-08 | |||
| JP2010000719A | 2010-01-07 | |||
| JP2007526820A | 2007-09-20 | |||
| JPS5951165B2 | 1984-12-12 |
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
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