REPLICATION AND TRANSFER OF MICROSTRUCTURES AND NANOSTRUCTURES

Title:

REPLICATION AND TRANSFER OF MICROSTRUCTURES AND NANOSTRUCTURES

Document Type and Number:

WIPO Patent Application WO2004027460

Kind Code:

A3

Abstract:

A method for the duplication of microscopic patterns from a master to a substrate is disclosed, in which a replica of a topographic structure on a master is formed and transferred when needed onto a receiving substrate using one of a variety of printing or imprint techniques, and then dissolved. Additional processing steps can also be carried out using the replica before transfer, including the formation of nanostructures, microdevices, or portions thereof. These structures are then also transferred onto the substrate when the replica is transferred, and remain on the substrate when the replica is dissolved. This is a technique that can be applied as a complementary process or a replacement for various lithographic processing steps in the fabrication of integrated circuits and other microdevices.

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Inventors:

SCHAPER CHARLES D (US)

Application Number:

PCT/US2003/029040

Publication Date:

July 29, 2004

Filing Date:

September 17, 2003

Export Citation:

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Assignee:

UNIV LELAND STANFORD JUNIOR (US)
SCHAPER CHARLES D (US)

International Classes:

B81C1/00; B82B3/00; G03F7/00; G03F7/09; H01L21/027; (IPC1-7): H01L21/31; H01L21/469

Foreign References:

US6656568B1	2003-12-02
US6518194B2	2003-02-11
US5629579A	1997-05-13

Other References: