Title:
RESIDUAL CHLORINE METER, AND METHOD FOR MEASURING RESIDUAL CHLORINE CONCENTRATION
Document Type and Number:
WIPO Patent Application WO/2020/045285
Kind Code:
A1
Abstract:
The objective of the present invention is to suppress a deterioration in residual chlorine concentration measuring accuracy attributable to adhesion of oxidation-reduction reaction products and the like onto a working electrode, without increasing the workload on the user, and without increasing the size, the complexity, or the price of the residual chlorine meter. A residual chlorine meter 1 is provided with: a measuring circuit 12 for measuring the residual chlorine concentration of a test liquid E on the basis of a voltage between a working electrode 2 and a reference electrode 3, with the working electrode 2 and the reference electrode 3 immersed in the test liquid E; a pre-treatment voltage applying circuit 11 for applying a pre-treatment voltage between the working electrode 2 and the reference electrode 3; and a microcontroller 14 which controls the measuring circuit 12 and the pre-treatment voltage applying circuit 11 in such a way that the pre-treatment voltage is applied, application of the pre-treatment voltage is then stopped, and the residual chlorine concentration in the test liquid E is then measured. Further, the pre-treatment voltage applying circuit 11 preferably sweeps the pre-treatment voltage.
Inventors:
IKEDA SATOSHI (JP)
KOIDE SATOSHI (JP)
KOIDE SATOSHI (JP)
Application Number:
PCT/JP2019/033076
Publication Date:
March 05, 2020
Filing Date:
August 23, 2019
Export Citation:
Assignee:
TANITA SEISAKUSHO KK (JP)
International Classes:
G01N27/38; G01N27/416
Foreign References:
| JP2006138650A | 2006-06-01 | |||
| JPH11333462A | 1999-12-07 | |||
| JP2017053746A | 2017-03-16 | |||
| US20030019748A1 | 2003-01-30 | |||
| CN107604324A | 2018-01-19 |
Attorney, Agent or Firm:
KITAMURA, Chikahiko (JP)
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