Title:
RESIDUE DISPOSAL METHOD, AND METHOD FOR PRODUCING TRICHLOROSILANE
Document Type and Number:
WIPO Patent Application WO/2018/074268
Kind Code:
A1
Abstract:
The purpose of the present invention is to achieve a residue disposal method which efficiently disposes of a residue without blocking a pipe, and which is capable of recovering a chlorosilane compound at an even higher recovery rate. In this method for disposing of a residue discharged as a result of a reaction product gas processing step in a method for producing trichlorosilane, a powder is obtained by performing drying such that the chlorosilane compound content in the residue is 10 mass% or lower.
Inventors:
YAMASHITA ISAO (JP)
Application Number:
PCT/JP2017/036491
Publication Date:
April 26, 2018
Filing Date:
October 06, 2017
Export Citation:
Assignee:
TOKUYAMA CORP (JP)
International Classes:
C01B33/107
Foreign References:
| JP2013010648A | 2013-01-17 | |||
| JP2006001804A | 2006-01-05 | |||
| JP2013231555A | 2013-11-14 | |||
| JP2009271022A | 2009-11-19 | |||
| JP2008093523A | 2008-04-24 | |||
| JP2005029428A | 2005-02-03 | |||
| JP2011504452A | 2011-02-10 |
Other References:
See also references of EP 3530620A4
Attorney, Agent or Firm:
HARAKENZO WORLD PATENT & TRADEMARK (JP)
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