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Title:
RESIN COMPOSITION, CURED FILM, METHOD FOR MANUFACTURING CURED FILM, SUBSTRATE HAVING MULTILAYER FILM, METHOD FOR MANUFACTURING PATTERNED SUBSTRATE, PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING PATTERN CURED FILM, METHOD FOR MANUFACTURING POLYMER, AND METHOD FOR MANUFACTURING RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2022/131277
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a resin composition that is a homogeneous liquid containing a polymer obtained by hydrolysis and polycondensation without precipitation during a sol-gel reaction, even with the introduction of a metal species having high EUV absorbance. The resin composition contains a polymer comprising (A) a constituent unit represented by general formula (1) and (B) a constituent unit represented by general formula (1-A). General Formula 1: [(R2)d(R3)e(OR4)fSiOg/2] General Formula (1-A):[(R1)bMOc/2] In general formula (1), R2 is a group represented by general formula (1a).

Inventors:
MASUBUCHI TAKASHI (JP)
OIKAWA YURI (JP)
YAMANAKA KAZUHIRO (JP)
Application Number:
PCT/JP2021/046165
Publication Date:
June 23, 2022
Filing Date:
December 15, 2021
Export Citation:
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Assignee:
CENTRAL GLASS CO LTD (JP)
International Classes:
C08G77/58; C08G79/00; G03F7/11; G03F7/20
Domestic Patent References:
WO2019167770A12019-09-06
Foreign References:
JP2010262230A2010-11-18
JP2015129908A2015-07-16
JP2009244722A2009-10-22
Attorney, Agent or Firm:
TAKAHASHI, HAYASHI AND PARTNER PATENT ATTORNEYS, INC. (JP)
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