RESIN COMPOSITION FOR OPTICAL STEREOLITHOGRAPHY

WIPO Patent Application WO/2013/172407

A1

[Problem] To provide a resin composition for optical stereolithography which does not include a toxic antimony-based cationic polymerization initiator, which is safe and exhibits excellent handling properties, and which provides stereolithographic products exhibiting excellent external appearance and excellent colour tones which do not yellow, and which have colourless translucency. [Solution] This resin composition for optical stereolithography includes a cation-polymerizable organic compound, a radical polymerizable organic compound, a cationic polymerization initiator, and a radical polymerization initiator. The resin composition for optical stereolithography further includes: an aromatic sulfonium compound represented by general formula (C-1) as the cationic polymerization initiator (in general formula (C-1): R1, R2, and R3 each represent a monovalent organic group; Rf is a fluoroalkyl group; m is the same number as the cationic charge of the "cation (S+(R1)(R2)(R3))" in general formula (C-1); and n is an integer in the range of 0-6); and an aromatic thiol compound represented by general formula (E) (in general formula (E): R4 is an aromatic hydrocarbon group having a valency of 1 or 2 which may have a substituent group; and p is either 1 or 2).

OGANE NOBUO (JP)
DAICHO YUYA (JP)
NAKAMOTO EIJI (JP)
HOMMA CHIHARU (JP)

PCT/JP2013/063643

November 21, 2013

May 16, 2013

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CMET INC (JP)

C08G65/18; B29C67/00

WO2011102286A1

2011-08-25

JP2010265408A	2010-11-25
JP2011089088A	2011-05-06
JP2007238828A	2007-09-20
JPS5214277A	1977-02-03
JPS5214278A	1977-02-03
JPS5214279A	1977-02-03
JP2007262401A	2007-10-11
JP2007238828A	2007-09-20
JP2011089088A	2011-05-06

See also references of EP 2851386A4

TSUJI YOSHIKO (JP)
Crossing Yoshiko (JP)

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