RESIN COMPOSITION FOR STEREOLITHOGRAPHY - KURARAY NORITAKE DENTAL INC

Title:

RESIN COMPOSITION FOR STEREOLITHOGRAPHY

Document Type and Number:

WIPO Patent Application WO/2021/162007

Kind Code:

A1

Abstract:

The present invention provides a resin composition for stereolithography, the resin composition excelling in strength of a molded object, toughness and water resistance. The present invention pertains to a resin composition for stereolithography, the resin composition comprising a urethanized (meth)acrylic compound (A), a (meth)acrylate compound (B) not containing a urethane bond, and a photopolymerization initiator (C). The compound (A) is a urethanized (meth)acrylic compound (A-1) having a polymer structure and/or a urethanized (meth)acrylic compound (A-2) not having a polymer structure. The weight average molecular weight of the compound (A-1) is less than 1000, and the molecular weight of the compound (A-2) is less than 1000. The compound (B) includes at least one selected from the group consisting of a (meth)acrylate compound (b-I) represented by general formula (I) and a (meth)acrylate compound (b-II) represented by general formula (II).

Inventors:

SUZUKI KENJI (JP)
ITO MISAKI (JP)

Application Number:

PCT/JP2021/004832

Publication Date:

August 19, 2021

Filing Date:

February 09, 2021

Export Citation:

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Assignee:

KURARAY NORITAKE DENTAL INC (JP)

International Classes:

C08F290/06; A61C11/00; A61C13/01; A61K6/30; B29C64/124; B29C64/314; B33Y10/00; B33Y70/00; B33Y80/00

Domestic Patent References:

WO2012011434A1	2012-01-26
WO2019189566A1	2019-10-03
WO2018181833A1	2018-10-04
WO2020071552A1	2020-04-09
WO2020218446A1	2020-10-29
WO2019189566A1	2019-10-03

Foreign References:

JP2019534804A	2019-12-05
JP2010189534A	2010-09-02
JP2019001939A	2019-01-10
JP2019099750A	2019-06-24
JPS56144478A	1981-11-10
JPS60247515A	1985-12-07
JP2000159621A	2000-06-13

Other References: