RESIN COMPOSITION FOR STEREOLITHOGRAPHY

WIPO Patent Application WO/2023/190931

A1

The present invention provides a resin composition for stereolithography, the resin composition being excellent in terms of strength, toughness, water resistance and impact resistance of a shaped article thereof. The present invention relates to a resin composition for stereolithography, the resin composition containing a multifunctional (meth)acrylic monomer (A) that has a molecular weight of less than 500, a multifunctional (meth)acrylic monomer (B) that has a molecular weight of not less than 500 but less than 2,000, a multifunctional (meth)acrylic monomer (C) that has a molecular weight of not less than 2,000, and a photopolymerization initiator (D). With respect to a total of 100% by mass of polymerizable monomers in this resin composition for stereolithography: the content of the multifunctional (meth)acrylic monomer (A) that has a molecular weight of less than 500 is 25% by mass to 75% by mass; the content of the multifunctional (meth)acrylic monomer (B) that has a molecular weight of not less than 500 but less than 2,000 is 8% by mass to 32% by mass; and the content of the multifunctional (meth)acrylic monomer (C) that has a molecular weight of not less than 2,000 is not less than 0.1% by mass but less than 10% by mass.

SUZUKI KENJI (JP)

PCT/JP2023/013297

October 05, 2023

March 30, 2023

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KURARAY NORITAKE DENTAL INC (JP)

C08F290/06; A61C7/08; A61C13/01; A61M16/06; B29C64/124; B33Y10/00; B33Y70/00

WO2021085481A1

2021-05-06

JP2021165375A	2021-10-14
JP2016525150A	2016-08-22
JP2020075941A	2020-05-21
JP2019001939A	2019-01-10
JP2021160085A	2021-10-11
JP2022099528A	2022-07-05

KAMADA Koichi et al. (JP)

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