Title:
RESIN COMPOSITION FOR USE IN AN ORGANIC THIN-FILM TRANSISTOR INSULATION LAYER, OVERCOAT INSULATION LAYER, AND ORGANIC THIN-FILM TRANSISTOR
Document Type and Number:
WIPO Patent Application WO/2011/125691
Kind Code:
A1
Abstract:
The disclosed resin composition for use in an organic thin-film transistor insulation layer makes it possible to manufacture an organic thin-film transistor that exhibits little hysteresis and has a threshold voltage with a low absolute value. Said resin composition contains: (A) a macromolecular compound that has a repeating unit having a group that contains a fluorine atom; and (B) an active hydrogen compound which is a fluorine resin.
Inventors:
YAHAGI ISAO (JP)
Application Number:
PCT/JP2011/057938
Publication Date:
October 13, 2011
Filing Date:
March 30, 2011
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO (JP)
YAHAGI ISAO (JP)
YAHAGI ISAO (JP)
International Classes:
H01L29/786; C08F212/14; C08F220/34; G09F9/30; H01L21/336; H01L51/05; H01L51/30
Domestic Patent References:
| WO2010024238A1 | 2010-03-04 | |||
| WO2009121672A1 | 2009-10-08 |
Foreign References:
| JPS61101083A | 1986-05-19 | |||
| JPH03290412A | 1991-12-20 |
Attorney, Agent or Firm:
TANAKA, Mitsuo et al. (JP)
Mitsuo Tanaka (JP)
Mitsuo Tanaka (JP)
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Claims:
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