Title:
RESIN COMPOSITION AND USE THEREOF
Document Type and Number:
WIPO Patent Application WO/2014/175231
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a resin composition containing a near-infrared ray absorbent, which has excellent light resistance and heat resistance. The resin composition according to the present invention comprises a near-infrared ray absorbent, a phosphoric acid triester and a resin, wherein the near-infrared ray absorbent comprises microparticles each comprising a phosphonic acid copper salt represented by general formula (1) [wherein R1 represents a monovalent group represented by the formula -CH2CH2-R11; and R11 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, or a fluorinated alkyl group having 1 to 20 carbon atoms], and the phosphoric acid triester is a phosphoric acid triester represented by general formula (2) [wherein R's independently represent an alkyl group, an alkenyl group, a phenyl group, or a phenyl group having a substituent].
Inventors:
IWAMA HIDEKI (JP)
MACHIDA KATSUICHI (JP)
MACHIDA KATSUICHI (JP)
Application Number:
PCT/JP2014/061202
Publication Date:
October 30, 2014
Filing Date:
April 21, 2014
Export Citation:
Assignee:
KUREHA CORP (JP)
International Classes:
C08L101/00; C03C27/12; C08K5/521; C08K5/5317; C08L23/08; C08L29/14
Domestic Patent References:
WO2012105150A1 | 2012-08-09 | |||
WO2009123016A1 | 2009-10-08 | |||
WO2014027639A1 | 2014-02-20 | |||
WO2013146497A1 | 2013-10-03 |
Foreign References:
JP2006240893A | 2006-09-14 | |||
JP2012201865A | 2012-10-22 | |||
JP2009242650A | 2009-10-22 | |||
JP2010083805A | 2010-04-15 | |||
JP2010150065A | 2010-07-08 | |||
JPS6114243A | 1986-01-22 | |||
JP2003327455A | 2003-11-19 |
Attorney, Agent or Firm:
SSINPAT PATENT FIRM (JP)
Patent business corporation SSINPAT (JP)
Patent business corporation SSINPAT (JP)
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