Title:
RESIN PRODUCTION METHOD, RESIN PRODUCED THEREBY, AND RESIN COMPOSITION CONTAINING SAME
Document Type and Number:
WIPO Patent Application WO/2016/013467
Kind Code:
A1
Abstract:
The present invention provides: a production method that makes it possible to obtain a high reaction yield of a resin in which the content of metal impurities is reduced and all or a part of phenolic hydroxyl groups are alkylated; a resin that is produced by the production method; and a resin composition that contains the resin. The production method is for producing a resin in which all or a part of phenolic hydroxyl groups are alkylated, and said production method includes a step in which a halogenated alkyl compound and a resin comprising a phenolic hydroxyl group are reacted under the presence of at least one organic base selected from the group consisting of tetraalkyl ammonium hydroxide compounds and nitrogen-containing compounds in which the acid dissociation constant of the conjugate acid is 12 or more.
Inventors:
SHIBUYA AKINORI (JP)
YONEKUTA YASUNORI (JP)
GOTO AKIYOSHI (JP)
KOJIMA MASAFUMI (JP)
YONEKUTA YASUNORI (JP)
GOTO AKIYOSHI (JP)
KOJIMA MASAFUMI (JP)
Application Number:
PCT/JP2015/070283
Publication Date:
January 28, 2016
Filing Date:
July 15, 2015
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
C08F8/02; C08G8/28; C08L101/06
Foreign References:
| JPH10182537A | 1998-07-07 | |||
| JP2006099097A | 2006-04-13 | |||
| JPH05140416A | 1993-06-08 | |||
| JPH05320332A | 1993-12-03 | |||
| JP2005272837A | 2005-10-06 |
Attorney, Agent or Firm:
WATANABE Mochitoshi et al. (JP)
Mochitoshi Watanabe (JP)
Mochitoshi Watanabe (JP)
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