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Title:
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2018/110429
Kind Code:
A1
Abstract:
Provided is a resin that contains structural units derived from a compound represented by formula (I') and structural units having an acid-labile group. (In the formula, R1 and R2 each independently denote an alkyl group that may have a halogen atom, a hydrogen atom or a halogen atom. Ar denotes an optionally substituted aromatic hydrocarbon group. L1 denotes a group represented by formula (X1-1) or the like. L11, L13, L15 and L17 each independently denote an alkane diyl group. L12, L14, L16 and L18 each independently denote -O-, -CO-, -CO-O-, -O-CO- or -O-CO-O-. * and ** denote bonds, and ** denotes a bond to an iodine atom.)

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Inventors:
MASUYAMA TATSURO (JP)
YAMAGUCHI SATOSHI (JP)
ICHIKAWA KOJI (JP)
Application Number:
PCT/JP2017/044030
Publication Date:
June 21, 2018
Filing Date:
December 07, 2017
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO (JP)
International Classes:
C08F20/02; C08F12/34; G03F7/004; G03F7/039
Domestic Patent References:
WO2010140372A12010-12-09
WO2012050015A12012-04-19
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Other References:
See also references of EP 3556781A4
Attorney, Agent or Firm:
NAKAYAMA, Tohru et al. (JP)
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