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Title:
RESIN STAMPER FOR USE IN NANOIMPRINTING AND NANOIMPRINTING APPARATUS USING SAME
Document Type and Number:
WIPO Patent Application WO/2012/014962
Kind Code:
A1
Abstract:
A resin stamper (10) which is for use in nanoimprinting and which is provided with a microstructure layer (2) on a light -transmitting substrate (1), said microstructure layer (2) being made of a polymer prepared from a resin composition comprising: a main component that consists of a silsesquioxane derivative having multiple polymerizable functional groups; a polymerizable resin component that has multiple polymerizable functional groups and that is other than the silsesquioxane derivative; and a photopolymerization initiator. Further, the resin stamper (10) is characterized in that the content of the photopolymerization initiator is 0.3 to 3% by mass relative to the total mass of the silsesquioxane derivative and the polymerizable resin component, and the microstructure layer (2) transmits a ray of light having a wavelength of 365nm at a ratio of 80% or more.

Inventors:
ISHII SATOSHI (JP)
OGINO MASAHIKO (JP)
SHIZAWA NORITAKE (JP)
MORI KYOICHI (JP)
MIYAUCHI AKIHIRO (JP)
Application Number:
PCT/JP2011/067220
Publication Date:
February 02, 2012
Filing Date:
July 28, 2011
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP (JP)
ISHII SATOSHI (JP)
OGINO MASAHIKO (JP)
SHIZAWA NORITAKE (JP)
MORI KYOICHI (JP)
MIYAUCHI AKIHIRO (JP)
International Classes:
B29C59/02; B29C33/40; H01L21/027
Foreign References:
JP2010141064A2010-06-24
JP2010036514A2010-02-18
JP2010280159A2010-12-16
JP2006338844A2006-12-14
JP2011170207A2011-09-01
Attorney, Agent or Firm:
ISONO Michizo (JP)
Michizo Isono (JP)
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