RESINS CURABLE WITH ACTINIC RADIATION, PROCESS FOR THE PRODUCTION THEREOF, AND PHOTO- AND THERMO-SETTING RESIN COMPOSITION

Title:

RESINS CURABLE WITH ACTINIC RADIATION, PROCESS FOR THE PRODUCTION THEREOF, AND PHOTO- AND THERMO-SETTING RESIN COMPOSITION

Document Type and Number:

WIPO Patent Application WO/2001/072857

Kind Code:

A1

Abstract:

A photo- and thermo-setting resin composition comprising (A) a resin curable with actinic radiation, which has one or more structures represented by the general formula (1), (B) a polymerization initiator, (C) a diluent, and (D) a polyfunctional oxetane compound. The resin curable with actinic radiation can be produced by reacting (a) a polyfunctional oxetane compound with (b) an unsaturated monocarboxylic acid to form a modified oxetane resin (a\') and then reacting the primary hydroxyl groups of the modified oxetane resin (a\') with (c) a polybasic acid anhydride. (In the general formula, R?1� is hydrogen or C�1-6? alkyl; R?2�, R?3� and R?4� are each hydrogen, C�1-6? alkyl, aryl, aralkyl, cyano, fluoro, or furyl; and X is a polybasic acid anhydride residue.)

Inventors:

NISHIKUBO TADATOMI (JP)
KAMEYAMA ATSUSHI (JP)
SASAKI MASAKI (JP)
KUSAMA MASATOSHI (JP)

Application Number:

PCT/JP2001/002487

Publication Date:

October 04, 2001

Filing Date:

March 27, 2001

Export Citation:

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Assignee:

UNIV KANAGAWA (JP)
TAIYO INK MFG CO LTD (JP)
NISHIKUBO TADATOMI (JP)
KAMEYAMA ATSUSHI (JP)
SASAKI MASAKI (JP)
KUSAMA MASATOSHI (JP)

International Classes:

C07C69/54; C07C69/593; C07C69/75; C08F283/10; C08F290/06; C08F299/02; C08G65/18; G03F7/038; G03F7/027; G03F7/032; G03F7/033; H05K3/28; (IPC1-7): C08F20/20; C08F299/02; G03F7/038; H05K3/28; H05K3/46

Foreign References:

JPH09179299A	1997-07-11
JPH02297558A	1990-12-10
JPH05202317A	1993-08-10
JPH03205404A	1991-09-06
JPH04348146A	1992-12-03
JPH11269211A	1999-10-05
JPH09241579A	1997-09-16

Other References: