RESIST COMPOSITION CONTAINING ORGANIC SOLVENT SOLUBLE DYE AND COLOR FILTER USING THE SAME

Title:

RESIST COMPOSITION CONTAINING ORGANIC SOLVENT SOLUBLE DYE AND COLOR FILTER USING THE SAME

Document Type and Number:

WIPO Patent Application WO/2006/041106

Kind Code:

A1

Abstract:

This invention provides a color resist composition that, by virtue of an increased dye concentration for meeting a film thickness reduction demand in a color filter, can exhibit high spectroscopic spectrum reproduction, high heat resistance, and lightfastness, and, at the same time, has a high resolution of not more than 5 µm and is free from any development residue. The resist composition comprises a dye containing cation represented by formula (1) wherein R¹, R², R³ and R⁴ each represent a hydrogen atom or an organic group. The dye is a sulfonic acid salt or a carboxylic acid salt.

Inventors:

HOSAKA KAZUYOSHI (JP)
YAMADA MARIKO (JP)
MAEDA SEISUKE (JP)
SUZUKI MASAYOSHI (JP)

Application Number:

PCT/JP2005/018815

Publication Date:

April 20, 2006

Filing Date:

October 12, 2005

Export Citation:

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Assignee:

NISSAN CHEMICAL IND LTD (JP)
HOSAKA KAZUYOSHI (JP)
YAMADA MARIKO (JP)
MAEDA SEISUKE (JP)
SUZUKI MASAYOSHI (JP)

International Classes:

G03F7/004; C08F2/50; C09B69/04; G02B5/20; G03F7/038

Foreign References:

JP2004029518A	2004-01-29
JP2003344998A	2003-12-03
JPH06248192A	1994-09-06
JPH07286106A	1995-10-31
JP2004051727A	2004-02-19

Attorney, Agent or Firm:

Hanabusa, Tsuneo c/o Hanabusa, Patent Office (Shin-Ochanomizu Urban Trinity 2, Kandasurugadai 3-chom, Chiyoda-ku Tokyo 62, JP)

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