Title:
RESIST COMPOSITION AND RESIST FILM
Document Type and Number:
WIPO Patent Application WO/2019/150966
Kind Code:
A1
Abstract:
Provided are: a resist composition which is capable of improving the coatability (coating film formability) with respect to a base material during spin coating and improving the adhesion of a resist film, while being capable of forming a good pattern; and a resist film which is provided with a good pattern. A resist composition which contains a polymer, a solvent and an aromatic vinyl monomer, and wherein the content of the aromatic vinyl monomer relative to the polymer is from 10 ppm by mass to 30,000 ppm by mass (inclusive).
Inventors:
HOSHINO MANABU (JP)
Application Number:
PCT/JP2019/001207
Publication Date:
August 08, 2019
Filing Date:
January 17, 2019
Export Citation:
Assignee:
ZEON CORP (JP)
International Classes:
G03F7/039; C08F12/06; G03F7/004; G03F7/20
Domestic Patent References:
| WO1999062964A1 | 1999-12-09 | |||
| WO2016132722A1 | 2016-08-25 |
Foreign References:
| JP2017218480A | 2017-12-14 | |||
| JP2003206322A | 2003-07-22 | |||
| JPH0968795A | 1997-03-11 | |||
| JP2003107703A | 2003-04-09 | |||
| US4985332A | 1991-01-15 | |||
| JPH083636B2 | 1996-01-17 |
Other References:
See also references of EP 3751345A4
Attorney, Agent or Firm:
SUGIMURA Kenji (JP)
Download PDF:
Previous Patent: CRANKSHAFT
Next Patent: ANALYSIS METHOD, LIQUID MEDICINE, AND METHOD FOR MANUFACTURING LIQUID MEDICINE
Next Patent: ANALYSIS METHOD, LIQUID MEDICINE, AND METHOD FOR MANUFACTURING LIQUID MEDICINE