RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYPHENOL COMPOUND USED THEREIN

Title:

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYPHENOL COMPOUND USED THEREIN

Document Type and Number:

WIPO Patent Application WO/2016/158169

Kind Code:

A1

Abstract:

The present invention is a compound represented by general formula (1).

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Inventors:

TOIDA TAKUMI (JP)
ECHIGO MASATOSHI (JP)
SATO TAKASHI (JP)
SHIMIZU YOUKO (JP)

Application Number:

PCT/JP2016/056333

Publication Date:

October 06, 2016

Filing Date:

March 02, 2016

Export Citation:

Assignee:

MITSUBISHI GAS CHEMICAL CO (JP)

International Classes:

C07D311/92; C07B61/00; C08G61/12; G03F7/004; G03F7/038

Foreign References:

Other References: