Title:
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYPHENOL COMPOUND USED THEREIN
Document Type and Number:
WIPO Patent Application WO/2016/158169
Kind Code:
A1
Abstract:
The present invention is a compound represented by general formula (1).
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Inventors:
TOIDA TAKUMI (JP)
ECHIGO MASATOSHI (JP)
SATO TAKASHI (JP)
SHIMIZU YOUKO (JP)
ECHIGO MASATOSHI (JP)
SATO TAKASHI (JP)
SHIMIZU YOUKO (JP)
Application Number:
PCT/JP2016/056333
Publication Date:
October 06, 2016
Filing Date:
March 02, 2016
Export Citation:
Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
C07D311/92; C07B61/00; C08G61/12; G03F7/004; G03F7/038
Foreign References:
US20140248561A1 | 2014-09-04 | |||
EP2743770A1 | 2014-06-18 | |||
US20140308615A1 | 2014-10-16 |
Other References:
See also references of EP 3279190A4
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
Yoshiyuki Inaba (JP)
Yoshiyuki Inaba (JP)
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