Title:
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2023/189961
Kind Code:
A1
Abstract:
This resist composition contains a resin component (A1) having: a constitutional unit (a01) derived from a compound represented by general formula (a0-1); and a constitutional unit (a02) including a lactone-containing cyclic group or the like. In the formula, W01 is a polymerizable group-containing group. Ya01 is a single bond or a divalent linking group. Ra01 is an acid-dissociable group. q is an integer of 0-3. n is an integer of 1 or greater. Here, n≤q×2＋4.
Inventors:
SUZUKI YOSUKE (JP)
SUZUKI KENTA (JP)
KOJIMA TAKAHIRO (JP)
YOSHIDA JUN (JP)
IKEUCHI KENGO (JP)
SUZUKI KENTA (JP)
KOJIMA TAKAHIRO (JP)
YOSHIDA JUN (JP)
IKEUCHI KENGO (JP)
Application Number:
PCT/JP2023/011293
Publication Date:
October 05, 2023
Filing Date:
March 22, 2023
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
International Classes:
G03F7/039; C07C65/05; C07C65/10; C07C309/12; C07C381/12; C07D327/04; C08F212/02; G03F7/004
Foreign References:
| JP2022007909A | 2022-01-13 | |||
| JP2008276182A | 2008-11-13 | |||
| JP2008090261A | 2008-04-17 | |||
| CN108314785A | 2018-07-24 | |||
| JP2022067056A | 2022-05-02 | |||
| JP2022067062A | 2022-05-02 |
Attorney, Agent or Firm:
TAZAKI Akira et al. (JP)
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