Title:
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2024/070672
Kind Code:
A1
Abstract:
This resist composition contains a crosslinking agent that reacts with ionizing radiation or non-ionizing radiation having a wavelength of 300 nm or less, a solvent, a polymer A, and a polymer B, the surface free energy of the polymer A being greater than the surface energy of the polymer B, and the difference between the surface free energy of the polymer A and the surface free energy of the polymer B being 3 mJ/m2 or more.
Inventors:
FUJIMURA MAKOTO (JP)
Application Number:
PCT/JP2023/033241
Publication Date:
April 04, 2024
Filing Date:
September 12, 2023
Export Citation:
Assignee:
ZEON CORP (JP)
International Classes:
G03F7/039; C08L33/16; G03F7/20
Domestic Patent References:
| WO2016035633A1 | 2016-03-10 | |||
| WO2022190714A1 | 2022-09-15 |
Foreign References:
| JP2018025687A | 2018-02-15 |
Attorney, Agent or Firm:
SUGIMURA Kenji (JP)
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