Title:
RESIST COMPOSITION AND METHOD FOR PRODUCING DEVICE USING SAME
Document Type and Number:
WIPO Patent Application WO/2017/188297
Kind Code:
A1
Abstract:
Provided is a resist composition that improves acid generation efficiency and is used to produce a photoresist having high sensitivity, high resolution, and high LWR properties. The present invention relates to a compound represented by general formula (1). (1) (In formula (1): Ar1 and Ar2 independently represent a phenylene group optionally having a substituent; R1 represents a member selected from the group consisting of a thioalkoxy phenyl group, an arylthio group, and a thioalkoxy group optionally having a substituent; X represents a member selected from the group consisting of a sulfur atom, an oxygen atom, and a direct bond; R2 represents either an aryl group or an alkyl group optionally having a substituent; each Y independently represents either an oxygen atom or a sulfur atom; R3 and R4 independently represent a linear, branched, or cyclic alkyl group optionally having a substituent; R3 and R4 are optionally bound to each other so as to form a ring structure together with two Y's in the formula; at least one of the carbon-carbon single bonds in the alkyl group included in R1, R2, R3, and R4 is optionally substituted with a carbon-carbon double bond or a carbon-carbon triple bond; and at least one of the methylene groups in the alkyl group included in R1, R2, R3, and R4 is optionally substituted with a heteroatom-containing divalent group.)
Inventors:
ENOMOTO SATOSHI (JP)
SUGA YUSUKE (JP)
SUGA YUSUKE (JP)
Application Number:
PCT/JP2017/016486
Publication Date:
November 02, 2017
Filing Date:
April 26, 2017
Export Citation:
Assignee:
TOYO GOSEI CO LTD (JP)
International Classes:
G03F7/004; C07C25/18; C07C309/06; C07C323/18; C09K3/00; G03F7/039; G03F7/20; G03F7/38
Domestic Patent References:
| WO2015019616A1 | 2015-02-12 | |||
| WO2015174072A1 | 2015-11-19 | |||
| WO2016133073A1 | 2016-08-25 |
Foreign References:
| JP2015061831A | 2015-04-02 | |||
| JP2015134904A | 2015-07-27 |
Attorney, Agent or Firm:
SK INTELLECTUAL PROPERTY LAW FIRM et al. (JP)
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