Title:
RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2022/265002
Kind Code:
A1
Abstract:
Provided is a resist composition comprising: a resin component having a constituent unit (a01a) having a polycyclic lactone-containing ring group and a constituent unit (a02) represented by general formula (a0-2); and a compound (B0) represented by general formula (b0). In the formulae, Ra05 to Ra08 independently represent a hydrogen atom or the like; X0 represents a bromine atom or an iodine atom; Rm represents a hydroxy group or the like; 1 ≦ nb1+nb2 ≦ 5; Yb0 represents a bivalent linking group or a single bond; Vb0 represents a single bond or the like; R0 represents a hydrogen atom or the like; Mm+ represents an m-valent organic cation; and m represents an integer of 1 or more.
Inventors:
UEHARA TAKUYA (JP)
MATSUSHITA TETSUYA (JP)
MIYAKAWA JUNICHI (JP)
NGUYEN KHANHTIN (JP)
KATO HIROKI (JP)
FUJIMOTO YUUKI (JP)
MATSUSHITA TETSUYA (JP)
MIYAKAWA JUNICHI (JP)
NGUYEN KHANHTIN (JP)
KATO HIROKI (JP)
FUJIMOTO YUUKI (JP)
Application Number:
PCT/JP2022/023758
Publication Date:
December 22, 2022
Filing Date:
June 14, 2022
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
International Classes:
G03F7/039; C07D327/06; C07D333/76; C08F220/12; G03F7/004; G03F7/20
Foreign References:
| JP2021080245A | 2021-05-27 | |||
| JP2020038358A | 2020-03-12 | |||
| JP2021026227A | 2021-02-22 | |||
| JP2021033262A | 2021-03-01 | |||
| JP2021081708A | 2021-05-27 |
Attorney, Agent or Firm:
TAZAKI Akira et al. (JP)
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