Title:
RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND SALT
Document Type and Number:
WIPO Patent Application WO/2024/024703
Kind Code:
A1
Abstract:
The present invention relates to a resist composition that generates an acid by exposure to light, and that exhibits a change in solubility to a liquid developer through the action of the acid. The resist composition contains a base material component (A) that exhibits a change in solubility to the liquid developer through the action of the acid, and an acid generating agent component (B) that generates the acid by exposure to light. The acid generating agent component (B) includes a compound represented by general formula (b1-1) described in the specification.
Inventors:
ARAI MASATOSHI (JP)
INARI TAKATOSHI (JP)
UCHIDA EMI (JP)
SAKATA MAKOTO (JP)
INARI TAKATOSHI (JP)
UCHIDA EMI (JP)
SAKATA MAKOTO (JP)
Application Number:
PCT/JP2023/026901
Publication Date:
February 01, 2024
Filing Date:
July 21, 2023
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
International Classes:
G03F7/004; C07C309/12; C07C309/17; C07C381/12; C08F220/12; C09K3/00; G03F7/039; G03F7/20
Foreign References:
| JP2014215548A | 2014-11-17 | |||
| JP2019014710A | 2019-01-31 |
Attorney, Agent or Firm:
EIKOH, P.C. (JP)
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