Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
RESIST COMPOSITION, PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/056369
Kind Code:
A1
Abstract:
Provided is a resist composition that contains a resin, the solubility of which in an alkaline developer liquid is increased by the action of an acid, while the solubility of which in an organic solvent is decreased by the action of an acid. The resin contains a repeating unit (a) having one or more *-OY0 groups that are substituents of aromatic rings, and a phenolic hydroxyl group (b) or a partial structure (c) represented by general formula (X) (wherein each of R1 and R2 independently represents a fluorine-substituted alkyl group, a fluorine-substituted cycloalkyl group or a fluorine-substituted aryl group). With respect to the resin, the *-OY0 group is decomposed by the action of an acid and produces a phenolic hydroxyl group; and Y0 represents a specific protecting group. In cases where the repeating unit (a) does not contain both a phenolic hydroxyl group (b) and a partial structure (c), the repeating unit (a) produces two or more phenolic hydroxyl groups through decomposition of the *-OY0 groups caused by the action of an acid.

Inventors:
HIRANO, Shuji (4000 Kawashiri Yoshidacho, Haibara-gu, Shizuoka 96, 〒4210396, JP)
KANEKO, Akihiro (4000 Kawashiri Yoshidacho, Haibara-gu, Shizuoka 96, 〒4210396, JP)
NIHASHI, Wataru (4000 Kawashiri Yoshidacho, Haibara-gu, Shizuoka 96, 〒4210396, JP)
FURUTANI, Hajime (4000 Kawashiri Yoshidacho, Haibara-gu, Shizuoka 96, 〒4210396, JP)
TSUBAKI, Hideaki (4000 Kawashiri Yoshidacho, Haibara-gu, Shizuoka 96, 〒4210396, JP)
Application Number:
JP2017/034142
Publication Date:
March 29, 2018
Filing Date:
September 21, 2017
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
FUJIFILM CORPORATION (26-30, NISHIAZABU 2-chome MINATO-K, Tokyo 20, 〒1068620, JP)
International Classes:
G03F7/039; C08F12/14; G03F7/038; G03F7/20
Foreign References:
JP3989149B22007-10-10
JP2003330191A2003-11-19
JP2013041140A2013-02-28
JP2002148788A2002-05-22
JP2001206917A2001-07-31
JP2009169406A2009-07-30
Attorney, Agent or Firm:
KURATA, Masatoshi et al. (11th Floor Celestine Shiba Mitsui Bldg., 3-23-1 Shiba, Minato-k, Tokyo 14, 〒1050014, JP)
Download PDF: