Title:
RESIST COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2014/061710
Kind Code:
A1
Abstract:
A resist composition according to the present invention comprises a resist base material and a solvent, wherein the resist base material contains a specific stereoisomer and the specific stereoisomer makes up 50 to 100 mass% of the resist base material.
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Inventors:
TAKASUKA MASAAKI (JP)
ECHIGO MASATOSHI (JP)
OKADA YU (JP)
OCHIAI YUMI (JP)
ECHIGO MASATOSHI (JP)
OKADA YU (JP)
OCHIAI YUMI (JP)
Application Number:
PCT/JP2013/078104
Publication Date:
April 24, 2014
Filing Date:
October 16, 2013
Export Citation:
Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
C07C39/17; G03F7/038; G03F7/004; H01L21/027
Foreign References:
| JP2003313546A | 2003-11-06 | |||
| JP2011081200A | 2011-04-21 | |||
| JP2009173623A | 2009-08-06 | |||
| JP2007197389A | 2007-08-09 | |||
| JP2008116677A | 2008-05-22 | |||
| JP2003321423A | 2003-11-11 | |||
| JPH11322656A | 1999-11-24 | |||
| JP2005326838A | 2005-11-24 | |||
| JP2008145539A | 2008-06-26 | |||
| JP2009173623A | 2009-08-06 | |||
| JPH06282067A | 1994-10-07 | |||
| JPH0764285A | 1995-03-10 | |||
| EP0632003A1 | 1995-01-04 | |||
| JPS6236663A | 1987-02-17 | |||
| JPS61226746A | 1986-10-08 | |||
| JPS61226745A | 1986-10-08 | |||
| JPS62170950A | 1987-07-28 | |||
| JPS6334540A | 1988-02-15 | |||
| JPH07230165A | 1995-08-29 | |||
| JPH0862834A | 1996-03-08 | |||
| JPH0954432A | 1997-02-25 | |||
| JPH095988A | 1997-01-10 | |||
| US5405720A | 1995-04-11 | |||
| US5360692A | 1994-11-01 | |||
| US5529881A | 1996-06-25 | |||
| US5296330A | 1994-03-22 | |||
| US5436098A | 1995-07-25 | |||
| US5576143A | 1996-11-19 | |||
| US5294511A | 1994-03-15 | |||
| US5824451A | 1998-10-20 |
Other References:
T. NAKAYAMA; M. NOMURA; K. HAGA; M. UEDA, BULL. CHEM. SOC. JPN., vol. 71, 1998, pages 2979
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
Yoshiyuki Inaba (JP)
Yoshiyuki Inaba (JP)
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