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Patent Searching and Data


Title:
RESIST MATERIAL
Document Type and Number:
WIPO Patent Application WO/2019/021758
Kind Code:
A1
Abstract:
With the purpose of the present invention being to provide a resist material having high coating film smoothness and uniformity, and excellent resolution or other patterning performance, a resist material is provided that contains a calixarene compound (A) having the molecular structure represented by structural formula (1), and a resin component (B). (In the formula: R1 is a perfluoroalkyl group or a structure unit having a perfluoroalkyl group; R2 is a hydrogen atom, a polar group, a polymerizable group, or a structure unit having a polar group or a polymerizable group; R3 is any of a hydrogen atom, an aliphatic hydrocarbon group that may have a substituent group, or an aryl group that may have a substituent group; n is an integer of 2-10; and * is the joining point with an aromatic ring.)

Inventors:
IMADA TOMOYUKI (JP)
YAMAMOTO SHINYA (JP)
MIYAMOTO MASANORI (JP)
Application Number:
JP2018/025164
Publication Date:
January 31, 2019
Filing Date:
July 03, 2018
Export Citation:
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Assignee:
DAINIPPON INK & CHEMICALS (JP)
International Classes:
G03F7/004; C07C323/16; G03F7/023
Domestic Patent References:
WO2018101057A12018-06-07
Foreign References:
JP2013079228A2013-05-02
JP2011033840A2011-02-17
US20070122734A12007-05-31
JP2009244766A2009-10-22
JPH10260556A1998-09-29
Attorney, Agent or Firm:
OGAWA Shinji (JP)
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