Title:
RESIST STRIPPING SOLUTION
Document Type and Number:
WIPO Patent Application WO/2020/194420
Kind Code:
A1
Abstract:
Due to the implementation of high-definition broadcast formats such as 4K and 8K, television screens are becoming larger, and consequently, to prevent a failure from occurring during element forming, photoresist baking temperatures are being raised, leading to the photoresists becoming difficult to strip. Large amounts of resist stripping solution are being used, so in order to lower the costs thereof, a resist stripping solution having a high regeneration rate is sought. The invention provides a resist stripping solution enabling stripping of a hard-baked resist and capable of regeneration by distillation.
The resist stripping solution is characterized by comprising a secondary cyclic amine compound, a tertiary polyamine compound, and 0.0001 to 0.15% by mass of a metal surface protectant.
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Inventors:
FUCHIGAMI SHINICHIROU
KITO YUSUKE
KOIKE KEITO
KITO YUSUKE
KOIKE KEITO
Application Number:
PCT/JP2019/012341
Publication Date:
October 01, 2020
Filing Date:
March 25, 2019
Export Citation:
Assignee:
PANASONIC IP MAN CO LTD (JP)
International Classes:
G03F7/42
Foreign References:
| JP2016085378A | 2016-05-19 | |||
| JP2006169553A | 2006-06-29 | |||
| JP2007256955A | 2007-10-04 | |||
| JP2006079093A | 2006-03-23 | |||
| JP2017530377A | 2017-10-12 |
Attorney, Agent or Firm:
HIROKOH Masaki (JP)
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