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Title:
RESIST TRIMMING METHOD AND TRIMMING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2010/010706
Kind Code:
A1
Abstract:
A resist trimming method includes a plasma generating step of generating plasma of a reaction gas; a removing step of removing ions and electrons from the generated plasma and selectively taking radicals; and a trimming step of trimming a resist pattern by irradiating the resist pattern with the plasma from which the ions and the electrons are removed.

Inventors:
MATSUI, Naoko (2-5-1 Kurigi, Asao-ku, Kawasaki-sh, Kanagawa 50, 〒2158550, JP)
松井尚子 (〒50 神奈川県川崎市麻生区栗木2-5-1キヤノンアネルバ株式会社内 Kanagawa, 〒2158550, JP)
KODAIRA, Yoshimitsu (2-5-1 Kurigi, Asao-ku, Kawasaki-sh, Kanagawa 50, 〒2158550, JP)
Application Number:
JP2009/003463
Publication Date:
January 28, 2010
Filing Date:
July 23, 2009
Export Citation:
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Assignee:
CANON ANELVA CORPORATION (2-5-1, Kurigi Asao-ku, Kawasaki-sh, Kanagawa 50, 〒2158550, JP)
キヤノンアネルバ株式会社 (〒50 神奈川県川崎市麻生区栗木2-5-1 Kanagawa, 〒2158550, JP)
MATSUI, Naoko (2-5-1 Kurigi, Asao-ku, Kawasaki-sh, Kanagawa 50, 〒2158550, JP)
松井尚子 (〒50 神奈川県川崎市麻生区栗木2-5-1キヤノンアネルバ株式会社内 Kanagawa, 〒2158550, JP)
International Classes:
H01L21/3065; G03F7/40; H01L21/027; H01L21/02; G03F7/40
Attorney, Agent or Firm:
OHTSUKA, Yasunori (7th Fl, Kioicho Park Bldg. 3-6, Kioicho, Chiyoda-k, Tokyo 94, 〒1020094, JP)
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