Title:
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING NOVOLAC POLYMER HAVING SECONDARY AMINO GROUP
Document Type and Number:
WIPO Patent Application WO/2015/098594
Kind Code:
A1
Abstract:
[Problem] To provide a resist underlayer film which has good hard mask function and is capable of forming a good pattern shape.
[Solution] A resist underlayer film-forming composition which contains a novolac polymer that is obtained by a reaction between an aromatic compound having a secondary amino group and an aldehyde compound, and which is used in a lithography process.
The novolac polymer contains a unit structure that is represented by formula (1). A method for manufacturing a semiconductor device which comprises: a step for forming a resist underlayer film on a semiconductor substrate with use of the resist underlayer film-forming composition of the present invention; a step for forming a hard mask on the resist underlayer film; a step for forming a resist film on the hard mask; a step for forming a resist pattern by means of light or electron beam irradiation and development; a step for etching the hard mask with use of the thus-formed resist pattern; a step for etching the resist underlayer film with use of the patterned hard mask; and a step for processing the semiconductor substrate with use of the patterned resist underlayer film.
More Like This:
Inventors:
NISHIMAKI HIROKAZU (JP)
HASHIMOTO KEISUKE (JP)
SAKAMOTO RIKIMARU (JP)
ENDO TAKAFUMI (JP)
HASHIMOTO KEISUKE (JP)
SAKAMOTO RIKIMARU (JP)
ENDO TAKAFUMI (JP)
Application Number:
PCT/JP2014/083130
Publication Date:
July 02, 2015
Filing Date:
December 15, 2014
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
G03F7/11; C08G12/08; G03F7/26; H01L21/027
Domestic Patent References:
| WO2013047516A1 | 2013-04-04 | |||
| WO2010147155A1 | 2010-12-23 | |||
| WO2012077640A1 | 2012-06-14 | |||
| WO2013115097A1 | 2013-08-08 | |||
| WO2013146670A1 | 2013-10-03 |
Foreign References:
| JP2015018222A | 2015-01-29 | |||
| JP2004198632A | 2004-07-15 | |||
| JP2004198812A | 2004-07-15 | |||
| JPH04268559A | 1992-09-24 | |||
| JP2002311569A | 2002-10-23 |
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
A patent business corporation is a なぶさ patent trademark office. (JP)
A patent business corporation is a なぶさ patent trademark office. (JP)
Download PDF: