Title:
RESIST UNDERLAYER FILM-FORMING COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2015/194273
Kind Code:
A1
Abstract:
[Problem] To provide a novel resist underlayer film-forming composition which is capable of forming a resist underlayer film that has etching resistance and excellent embeddability of a surface having recesses and/or projections.
[Solution] A resist underlayer film-forming composition which contains a polymer having a structural unit represented by formula (1) or formula (2) and a solvent.
(In the formulae, X represents an arylene group; n represents 1 or 2; and each of R1, R2, R3 and R4 independently represents a hydrogen atom, a hydroxy group, an alkyl group having 1-3 carbon atoms or a phenyl group.)
Inventors:
NISHIMAKI HIROKAZU (JP)
HASHIMOTO KEISUKE (JP)
ENDO TAKAFUMI (JP)
SAKAMOTO RIKIMARU (JP)
HASHIMOTO KEISUKE (JP)
ENDO TAKAFUMI (JP)
SAKAMOTO RIKIMARU (JP)
Application Number:
PCT/JP2015/063097
Publication Date:
December 23, 2015
Filing Date:
May 01, 2015
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
G03F7/11; C08G8/02
Domestic Patent References:
| WO2013047106A1 | 2013-04-04 | |||
| WO2013115097A1 | 2013-08-08 | |||
| WO2014157881A1 | 2014-10-02 |
Foreign References:
| KR20130039864A | 2013-04-23 | |||
| JP2014024831A | 2014-02-06 | |||
| JP2013253227A | 2013-12-19 |
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
A patent business corporation is a なぶさ patent trademark office. (JP)
A patent business corporation is a なぶさ patent trademark office. (JP)
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