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Title:
RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING NOVOLAC RESIN REACTED WITH AROMATIC METHYLOL COMPOUND
Document Type and Number:
WIPO Patent Application WO/2016/021594
Kind Code:
A1
Abstract:
[Problem] To provide a resist underlayer film for lithography, which has high solubility in a resist solvent (a solvent used in lithography) for developing good film formability by coating and a dry etching rate selectivity lower than that of the resist. [Solution] A resist underlayer film forming composition, which contains a novolac resin containing a structure (C) that is obtained by a reaction between an aromatic ring of an aromatic compound (A) and a hydroxy group-containing aromatic methylol compound (B). The aromatic compound (A) is a component for constituting the structure (C) that is contained in the novolac resin. The hydroxy group-containing aromatic methylol compound (B) is represented by formula (1). The hydroxy group-containing aromatic methylol compound (B) is 2-hydroxybenzyl alcohol, 4-hydroxybenzyl alcohol or 2,6-di-tert-butyl-4-hydroxymethyl phenol.

Inventors:
NISHIMAKI, Hirokazu (Ltd. Materials Research Laboratories 635, Sasakura, Fuchu-machi, Toyama-sh, Toyama 53, 〒9392753, JP)
SAKAMOTO, Rikimaru (Ltd. Materials Research Laboratories 635, Sasakura, Fuchu-machi, Toyama-sh, Toyama 53, 〒9392753, JP)
HASHIMOTO, Keisuke (Ltd. Materials Research Laboratories 635, Sasakura, Fuchu-machi, Toyama-sh, Toyama 53, 〒9392753, JP)
ENDO, Takafumi (Ltd. Materials Research Laboratories 635, Sasakura, Fuchu-machi, Toyama-sh, Toyama 53, 〒9392753, JP)
Application Number:
JP2015/072081
Publication Date:
February 11, 2016
Filing Date:
August 04, 2015
Export Citation:
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Assignee:
NISSAN CHEMICAL INDUSTRIES, LTD. (7-1 Kanda-Nishiki-cho 3-chome, Chiyoda-ku Tokyo, 54, 〒1010054, JP)
International Classes:
G03F7/11; C08G8/24; C08G14/06; C08G14/073; C08G14/09
Domestic Patent References:
WO2013146670A12013-10-03
WO2013047516A12013-04-04
Foreign References:
JP2014024831A2014-02-06
JP2013156627A2013-08-15
JP2005156816A2005-06-16
Other References:
SHITSUMON CORNER, CSJ: THE CHEMICAL SOCIETY OF JAPAN KINKI SHIBU, 28 August 2015 (2015-08-28), Retrieved from the Internet [retrieved on 20150828]
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (Shin-Ochanomizu Urban Trinity, 2 Kandasurugadai 3-chome, Chiyoda-k, Tokyo 62, 〒1010062, JP)
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