Title:
RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING NOVOLAC RESIN REACTED WITH AROMATIC METHYLOL COMPOUND
Document Type and Number:
WIPO Patent Application WO/2016/021594
Kind Code:
A1
Abstract:
[Problem] To provide a resist underlayer film for lithography, which has high solubility in a resist solvent (a solvent used in lithography) for developing good film formability by coating and a dry etching rate selectivity lower than that of the resist. [Solution] A resist underlayer film forming composition, which contains a novolac resin containing a structure (C) that is obtained by a reaction between an aromatic ring of an aromatic compound (A) and a hydroxy group-containing aromatic methylol compound (B). The aromatic compound (A) is a component for constituting the structure (C) that is contained in the novolac resin. The hydroxy group-containing aromatic methylol compound (B) is represented by formula (1). The hydroxy group-containing aromatic methylol compound (B) is 2-hydroxybenzyl alcohol, 4-hydroxybenzyl alcohol or 2,6-di-tert-butyl-4-hydroxymethyl phenol.
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Inventors:
NISHIMAKI HIROKAZU (JP)
SAKAMOTO RIKIMARU (JP)
HASHIMOTO KEISUKE (JP)
ENDO TAKAFUMI (JP)
SAKAMOTO RIKIMARU (JP)
HASHIMOTO KEISUKE (JP)
ENDO TAKAFUMI (JP)
Application Number:
PCT/JP2015/072081
Publication Date:
February 11, 2016
Filing Date:
August 04, 2015
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
G03F7/11; C08G8/24; C08G14/06; C08G14/073; C08G14/09
Domestic Patent References:
| WO2013146670A1 | 2013-10-03 | |||
| WO2013047516A1 | 2013-04-04 |
Foreign References:
| JP2014024831A | 2014-02-06 | |||
| JP2013156627A | 2013-08-15 | |||
| JP2005156816A | 2005-06-16 |
Other References:
SHITSUMON CORNER, CSJ: THE CHEMICAL SOCIETY OF JAPAN KINKI SHIBU, 28 August 2015 (2015-08-28), Retrieved from the Internet [retrieved on 20150828]
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
Patent business corporation なぶさ patent trademark office (JP)
Patent business corporation なぶさ patent trademark office (JP)
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