RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING COMPOUND HAVING HYDANTOIN RING

Title:

RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING COMPOUND HAVING HYDANTOIN RING

Document Type and Number:

WIPO Patent Application WO/2018/012253

Kind Code:

A1

Abstract:

[Problem] To provide a novel resist underlayer film forming composition which contains a compound having a hydantoin ring. [Solution] A resist underlayer film forming composition which contains: a compound that has at least two substituents represented by formula (1) in each molecule; and a solvent. (In the formula, each of R1 and R2 independently represents a hydrogen atom or a methyl group; and X1 represents a hydroxyalkyl group having 1 to 3 carbon atoms or an alkyl group having 2 to 6 carbon atoms, while having one or two ether bonds in the main chain.)

Inventors:

OGATA HIROTO (JP)
GOTO YUICHI (JP)
ENDO MASAHISA (JP)
USUI YUKI (JP)
KISHIOKA TAKAHIRO (JP)

Application Number:

PCT/JP2017/023211

Publication Date:

January 18, 2018

Filing Date:

June 23, 2017

Export Citation:

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Assignee:

NISSAN CHEMICAL IND LTD (JP)

International Classes:

G03F7/11; C07C43/13; C07D251/34; C07D403/14; C08L65/00; G03F7/20; H01L21/027

Domestic Patent References:

WO2015019961A1	2015-02-12
WO2008047715A1	2008-04-24

Foreign References:

JP2000508978A	2000-07-18
JPS5021730A	1975-03-07
JP2007277514A	2007-10-25